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I am gathering information about the advantages of masking. Needless to say, opinions vary from those which maintain almost all fine prints would benefit from at least an unsharp mask ( USM ), to those who believe that masking has little objective evidence to commend the technique to general use. Nevertheless, for those of us who are dedicated to BTZS methodology. I wonder if anyone on our list has applied BTZS methodology to masking, and what modifications they have used. For example, one has read that USM work best on higher then normal contrast negatives. Thus, for those who are using masks, are you simply developing longer, and if so, any "rule of thumb" that might be easily applicable? One would rather NOT repeat the construction of film curves if possible! In addition, how are you exposing the masking film?
I appreciate any in comments.
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